Nanopatterning

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FACILITIES for Nanopatterning

  • E-beam writing - Zeiss LEO 1560
  • Si and Ni stamp fabrication for nanoimprinting
  • Roll to roll nanoimprinting
  • Nanoimprint lithography tool NPS300 with
    • step&repeat mode
    • thermal NIL
    • UV NIL sub-50 nm patterns
    • 250 nm overlay accuracy
    • Substrate size up to 300mm

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