Background

Chemical Vapour Deposition (CVD) is a method to deposit high quality thin films onto a substrate. There exist several variants of this technology, e.g., Plasma Enhanced Chemical Vapour Deposition (PECVD) and Metalorganic Chemical Vapour Deposition (MOCVD). CVD is a common process within semiconductor fabrication. Atomic Layer Deposition (ALD) is similar to CVD but the differ in that the precursor materials are kept separate during the reaction.