Major Equipment at TKK
Lithography
- Mask aligner "Mauri Antero" (Karl Süss MA6/BA6)
- Mask aligner Electronic Visions AL6-2 (double sided)
- Mask aligner LOMO
- Mask aligner Suss MJB3
- Spinner BLE20
- Ovens/hotplates
- LEO Supra 40 SEM / e-beam lithography system
- Focused beam system FIB
Oxidation and diffusion
- Horizontal furnace Centrotherm
- Horizontal furnace Thermco (4 tubes)
Ion implantation
Annealing
- Minifurnace ATV PEO 601
- Minifurnace Minibrute
- RTA Foton-6
- Annealing tubes also available in the Centrotherm and Thermco furnaces
Thin Film Deposition
- TFS 500 ALD (Beneq)
- LPCVD nitride Centrotherm
- LPCVD Doped Polysilicon
- PECVD (Oxford 80+)
- Sputter (Oxford 400)
- Electron Beam Evaporator (IM9912)
- Thermal evaporators
- RF Sputter (Thin film lab)
Etching
Wet processing
- cleaning baths
- etching baths
- photoresist stripping
- electroplating
- electrochemical etching
- PDMS casting
- sublimation
Epitaxy
Bonding
- Aligner Wafer Bonder (AML AWB-04)
- Anodic bonder
Backend
- Dicing saw Loadpoint Microace 3
- High Frequency Probe Station
- Probe station
- Tepla
Test and measurement
- Atomic Force Microscope NT-MDT Ntegra
- SEM
- Profilometer
- Reflectometer
- Ellipsometer
- Spectroscopic Ellipsometer
- Digiscope
- WT-85X 400 Lifetime Scanner
- DLS-83D Deep Level Spectrometer (DLTS)
- Hall-measurement system
- Mapping, controlled atmosphere Kelvin-probe system
- Raman
- Tabletop SEM
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